Enterprise Name: Shenzhen Oric Electronics Co., Ltd.
Tel: +86-755-85276665
Mobile phone: +86-18924648655
Mailbox: Lisa@oriclcd.com
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Office Address: 4th floor, Building B, No.48th,
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Longhua District, Shenzhen, China 518110
What are the parts of manufacturing technology of TFT LCD screen--OLED display manufacturer
The manufacturing process of TFT LCD includes the following parts: forming TFT arrays on the TFT substrate; forming color filter patterns on the color filter substrate and forming two LCD boxes on the ITO conductive layer; installing peripheral circuits and assembling module assemblies such as backlight.
1. The technology of forming TFT arrays on TFT substrates has been industrialized, including amorphous silicon TFT (a-si tft), polycrystalline silicon TFT (p-si tft) and monocrystalline silicon TFT (c-si tft). At present, a-Si TFT is still the most widely used. The fabrication process of a-Si TFT is to sputter the grid material film on the borosilicate glass substrate and form the grid wiring pattern after exposure, development and dry etching of the mask.
Stepping exposure machine is usually used for mask exposure. The second step is to form SiNx film, undoped a-Si film and phosphorus-doped n+a-si film by PECVD method. Then mask exposure and dry etching are performed to form a-Si pattern of the TFT part. The third step is to form transparent electrodes (ito films) by sputtering, and then expose the ITO films and etch them by wet etching to form the pattern of display electrodes. The fourth step is to use the mask exposure and dry etching method to form the contact hole pattern of the insulating film at the extreme part of the gate.
The fifth step is to sputter Al and other materials into films, expose and etch the mask to form the source, drain and signal line patterns of tft. Finally, a protective insulating film is formed by PECVD method, and then the insulating film is etched by mask exposure and dry etching. (The protective film is used to protect the gate, signal line and display electrode.) So far, the whole process is completed.
TFT array technology is the key of TFT-LCD manufacturing process, and also the most part of equipment investment. The whole process requires very high purification conditions (e.g. grade 10).
2. The process of forming color filter pattern on the base of color filter (cf). The forming methods of the coloring part of color filter are dye method, pigment dispersion method, printing method, electrodeposition method and inkjet method. At present, pigment dispersion is the main method.
The first step of pigment dispersion method is to disperse fine pigments with uniform particle size (average particle size less than 0.1 um) (r, g, B tricolor) in transparent photosensitive resins. Then they are coated, exposed and developed in turn to form R. g. B trichrome patterns. Photoetching technology is used in manufacturing. The main devices used are coating, exposure and developing devices.
In order to prevent light leakage, the black matrix (bm) is usually added at the junction of RGB and tricolor. In the past, single-layer metal chromium films were formed by sputtering, but now resin-based BM films with composite metal chromium and chromium oxide or resin-mixed carbon are also used.
In addition, a protective film and it0 electrodes need to be fabricated on the bm, because the substrate with color filter is used as the front substrate of the liquid crystal screen and the back substrate with TFT to form the liquid crystal cell. Therefore, we must pay attention to the positioning problem, so that each unit of the color filter corresponds to each pixel of the TFT substrate.
